Inspect
Evaluate defect classes, spatial signatures and image retrieval against labeled inspection examples.
Explore Manufacturing & semiconductorsA pattern is a clue.
Semiconductor intelligence /Semiconductor
A pattern is a clue.
Follow the evidence.
Connect wafer signatures, inspection results and process history. Specialist agents assemble the evidence behind an excursion so yield engineers can compare hypotheses and choose the next investigation.
INSPECTION · PROCESS CONTEXT · YIELD LEARNINGFrom spatial signature to investigationILLUSTRATIVE SYSTEM
01 /The investigation bench
A signature starts a question.
Evidence moves it forward.
Explore three illustrative spatial patterns. The pattern changes the next check; it does not establish the root cause.
WAFER SIGNATUREILLUSTRATIVE
INVESTIGATION / 01
Look beyond the edge.
A spatial pattern gives the investigation a direction. Compare related lots, chambers and steps before attributing a cause.
EVIDENCE TO JOINInspection map + lot genealogy
ENGINEERING QUESTIONDoes the pattern repeat on the same tool path?
THE NEXT CHECK
Compare neighboring lots and relevant process traces.
InspectionWafer & lotTool & chamberProcess windowEngineer review
02 /Connect the engineering context
Work across the evidence,
not one isolated signal.
A model can identify an unusual pattern. Agent orchestration carries the investigation across the systems that explain it.
Correlate
Join lot genealogy, tool history, metrology and time-aligned traces through permitted data interfaces.
Investigate
Retrieve prior excursions, compare hypotheses and preserve the evidence for a process engineer.
03 /The release boundary
Better investigation.
Engineering authority.
Engineers validate candidate causes and approve any process or recipe change.
INTEGRATIONMES, inspection, metrology and FDCMap lot identifiers, event timestamps and source permissions before joining the data.
ACCEPTANCEDefect recall, nuisance rate and evidence coverageEvaluate by defect class and process context, including drift and investigation effort.
PROCESS IPAgreed hosting, data access and change controlProcess IP, recipes and inspection data stay within the agreed access and deployment boundaries. Recommendations do not bypass manufacturing change control.
NEXT /A focused first engagement
Start with one recurring investigation.
Agree the workflow, the available data and the acceptance criteria. Build a bounded pilot, evaluate it with your team, then decide what to extend.
Shape your Semiconductor intelligence projectCUSTOM DEVELOPMENT · QUOTATION ON REQUESTWHAT WE DEFINE TOGETHER
01A traceable inspection-to-process data path
02A bounded investigation assistant
03An engineer-reviewed evaluation by defect class
Read the benchmark-based scenarioThe case file is a modeled engagement, not a client result.Industry contextKLA process and yield analysis